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The national major scientific research instrument and equipment project undertaken by Changchun Optical Machinery passed the acceptance
[ Instrument R&D of Instrument Network ] On August 24-25, 2020, the Information Science Department of the National Natural Science Foundation of China organized experts in Changchun to carry out a project on the "1.5m Scanning Interferometric Field Exposure System", a national major scientific research instrument and equipment development project of the National Natural Science Foundation of China. acceptance.
The meeting established an acceptance expert group headed by Academician Li Tianchu of the Chinese Academy of Metrology. It consists of an instrument testing expert group, a technical archive expert group and a financial expert group. On August 24, the acceptance expert group carried out the on-site instrument test, and carried out the technical file and financial acceptance work.
Project acceptance meeting acceptance expert group meeting
On August 25th, Zhang Zhaotian, executive deputy director of the Information Science Department of the National Natural Science Foundation of China, presided over the project acceptance review meeting. Wang Chengwen, deputy director of the National Natural Science Foundation of China, Jia Ping, director of the Changchun Institute of Optics and Mechanics, the project support unit, and Zheng Xiaonian, director of the Bureau of Condition Guarantee and Finance of the Chinese Academy of Sciences, delivered speeches respectively, affirming the spirit and dedication of the project team to overcome difficulties and work hard The contribution emphasized the important position of equipment in scientific research, technological innovation, and the construction of a powerful country in science and technology, and hopes that Changchun Institute of Optics and Mechanics will give full play to the important role of major national scientific research equipment.
The expert group listened to the research and development project work report of the project leader, researcher Bayinhe Xige, the project supervision report of the project supervision team researcher Zhu Wenbin, the inspection report of the instrument technology test report of the deputy leader of the expert group Tang Yuguo, and the leader of the technical archives expert team Professor Shi Huimin’s file acceptance report and the financial acceptance expert group leader Gao Lian’s financial acceptance report. The acceptance expert group conducted on-site inspections and instrument tests on the technical indicators of the instrument, and audited the project technical document files and filing conditions, and related accounting reports. After questioning and discussion, it was agreed that the project passed the acceptance.
Researcher Bayinhesige reported on the completion of the project
The expert team believes that the project team has fully completed the project’s development tasks and successfully developed a 1.5-meter scanning interference field exposure system. The performance of the instrument has reached or exceeded the specifications of the mandate; the project management documents and technical documents are comprehensively recorded. The content is authentic and reliable, and the filing of the archives meets the requirements of the specifications; the use of project funds meets the requirements of the management method; during the project implementation, cutting-edge exploration and technical research on a series of core physical and technical issues in the production of single large-size holographic gratings have been achieved, and a series of important Research results, technological innovation and breakthroughs.
The specially developed equipment includes a 1.5-meter scanning interferometric field exposure system and four auxiliary process equipment required for making holographic gratings. The project is mainly for the urgent needs of large-area holographic gratings in strategic high-tech fields such as high-energy petawatt laser output technology, laser inertial confinement nuclear fusion research and high-end lithography machine industry, and has developed a 1.5-meter scanning interference field exposure system. Its goal is It has the ability to produce 500mm×1500mm holographic gratings by step-scan multi-line exposure. After 7 years of research, the project team has developed a large production area of ​​650mm×1700mm by solving and breaking through more than a dozen basic problems and key technologies such as ultra-precision positioning of long-range heavy-duty workbenches, ultra-precision measurement of exposure interference fields, and phase locking. A scanning interference field exposure system capable of single-piece seamless holographic grating. The smooth implementation and acceptance of the project indicates that my country has the ability to independently produce meter-level monomer seamless holographic gratings, breaking the long-term monopoly by foreign countries, and has a strong impact on high-energy lasers, controlled nuclear fusion, high-end lithography and other fields. The advancement of technology and industry is of great strategic significance.
At the acceptance meeting, the leaders and the project acceptance expert team affirmed the fruitful results of the project team in the development of large-scale scientific research instruments, and stated that many technical indicators of the instrument reached the advanced level. The project leader Bayinhe Xige said that the acceptance of the project is a new starting point. The project team will continue to study hard, overcome difficulties, and continuously promote the transformation of scientific and technological achievements of the project, and contribute to the development of national scientific and technological progress and related fields. .
Group photo of representatives from the project acceptance meeting